Servers and Data Acquisition

EHT Semi semiconductor fabrication | Plasma Generation, Wafer Bias, Chucking, IED, ALE, HAR, Multistate

EHT Semi Semiconductor Fabrication Tutorials

Select from the following topics to read more about the state-of-the-art of semiconductor fabrication:

Highest Precision IED

Atomic Layer Etching (ALE)

High-Aspect-Ratio (HAR)

Multistate

Voltage and Ion Energy

Bias Waveforms

EHT Semi Semiconductor Fabrication Products

The EHT Semi plasma products achieve the highest semiconductor fabrication etch quality with precision control of the ion energy distribution (IED) at lowest minimum critical dimensions, yet with etching rates comparable to RF generators.

Our product range for semiconductor fabrication is summarized in the following table. Click any link for further information:

Model	Applications	Uni- or Bipolar	maximums:			MHz
Model	Applications	Uni- or Bipolar	kV	kW	A	MHz
Spartan™	Wafer bias, Chucking	Unipolar	14	20	175	600
Hoplite™	Wafer bias, Chucking	Unipolar	18	5	130	600
Perseus™	Wafer bias	Bipolar	16	20	110	600
Mid-Freq. RF™	Wafer bias, Plasma generation	Bipolar	25	100	3 кА	1
High-Freq. RF™	Wafer bias, Plasma generation	Bipolar	10	20	кА	15